Search results for "Beam divergence"
showing 7 items of 7 documents
On the optimum form of an aperture for a confinement of the optically excited electric near field.
2008
Summary A triangular nanoaperture in an aluminium film was used previously as a probe in a scanning near-field optical microscope to image single fluorescent molecules with an optical resolution down to 30 nm. The high-resolution capability of the triangular aperture probe is because of a highly confined spot of the electric near field which emerges at an edge of the aperture, when the incident light is polarized perpendicular to this edge. Previous numerical calculations of the near-field distribution of a triangular aperture in a planar metal film using the field susceptibility technique yielded a nearly quantitative agreement with the experimental results. Using the same numerical techni…
Multipass amplifiers with self-compensation of the thermal lens
2018
We present a novel architecture for a multi-pass amplifier based on a succession of optical Fourier transforms and short propagations that shows a superior stability for variations of the thermal lens compared to state-of-the-art 4f-based amplifiers. We found that the proposed multi-pass amplifier is robust to variations of the active medium dioptric power. The superiority of the proposed architecture is demonstrated by analyzing the variations of the size and divergence of the output beam in form of a Taylor expansion around the design value for variations of the thermal lens in the active medium. The dependence of the output beam divergence and size is investigated also for variations of …
Resolution performance of programmable proximity aperture MeV ion beam lithography system
2007
AbstractAn ion beam lithography system for light and heavy ions has been developed at the University of Jyväskylä's Accelerator Laboratory. The system employs a programmable proximity aperture to define the beam. The proximity aperture is made up of four Ta blades with precise straight edges that cut the beam in the horizontal and vertical directions. The blade positions and dimensions are controlled by a pair of high-precision linear-motion positioners. The sample is mounted on a X-Y-Z stage capable of moving with 100 nm precision steps under computer control. The resolution performance of the system is primarily governed by the proximity aperture. Pattern edge sharpness is set by the beam…
Aperture-edge scattering in MeV ion-beam lithography. II. Scattering from a rectangular aperture
2009
The capability of collimators to define beams of MeV ions with sub-100nm dimensions has recently been demonstrated. Such nanometer beams have potential applications in MeV ion-beam lithography, which is the only maskless technique capable of producing extremely high aspect-ratio micro- and nanostructrures, as well as in high resolution MeV ion-beam imaging. Ion scattering from the collimator edges can be a resolution-restricting factor in these applications. Scattering processes at edges are difficult to study using conventional simulation codes because of the complicated geometry. In this part of our work, the authors used the GEANT4 toolkit as a simulation tool for studying the behavior o…
Aperture edge scattering in focused MeV ion beam lithography and nuclear microscopy: An application for the GEANT4 toolkit
2009
Collimators are widely used to define MeV ion beams. Recent studies have shown the capability of combinations of collimators and lenses to define beams of MeV ions with sub-100 nanometre dimensions. Such nanometre beams have potential applications in MeV ion beam lithography, which is the only maskless technique capable of producing extremely high aspect ratio micro- and nano-structrures, as well as in high resolution MeV ion beam based imaging. The ion scattering from the collimator-edges can be a resolution restricting factor in these applications. Scattering processes at edges are difficult to study using conventional simulation codes because of the complicated geometry. In this work we …
Strong field amplification of XUV: phase matching aspects
2011
The dependence of the yield of high-order harmonic generation (HHG) on several important experimental parameters has been successfully modeled in the last 20 years by taking into account the single atom response and propagation effects. We extended this description by adding a stimulated emission process and named it x-ray parametric amplification (XPA). Beyond the super-quadratic increase of the XUV signal, which can be explained only in a limited pressure range by HHG theory, other observed characteristics like exponential growth, gain narrowing, strong blue-shift, beam divergence, etc. and their dependence on laser intensity and gas pressure can be explained accurately only by the new XP…
Rigorous analysis of three-dimensional beam transmission through a dielectric slab
1997
The plane-wave-spectrum technique is applied to study the transmission of a three-dimensional beam through a dielectric slab. The electromagnetic beam radiated from an aperture antenna is represented by an angular spectrum of plane waves. The use of three different co-ordinate systems using rectangular co-ordinates allows a rigorous formulation to be obtained. The near field transmitted through a dielectric slab is obtained and compared with measurements.